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Sputtering target material Product List

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Polycrystalline silicon (Si) target

Polycrystalline silicon (Si) target

Poly-Silicon target supplier, Poly-Si target manufacturer, Multicrystalline silicon target price Used as components in devices such as CVD equipment, annealing furnaces, and diffusion furnaces! Polycrystalline silicon materials suitable for applications requiring high purity and thermal properties!

■ Purity > 99.9999% ■ Density (2.33/cm³) ■ Manufacturing methods: Melting method and sintering method *For more details, please download the PDF or feel free to contact us.

  • Other polymer materials
  • Composite Materials
  • Sputtering target material

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ITO (90:10; 95:5; 97:3...)Low-density ITO Target

ITO (90:10; 95:5; 97:3...)Low-density ITO Target

Oxides that can be used as transparent electrodes and to control pixels without compromising the visual information of the screen!

■ Each Ratios (90:10; 95:5; 97:3) ■ Manufacturing method: Powder metallurgy *For more details, please download the PDF or feel free to contact us.

  • Ceramics
  • Sputtering target material

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Sputtering target material

Sputtering target material

About sputtering target materials

We offer a variety of sputtering targets, including Cr, Ti, CrAl, WC, and many other materials. We can also accommodate different shapes and dimensions, such as round, plate, and rod shapes, according to our customers' needs. We look forward to your requests.

  • Sputtering Equipment
  • Sputtering target material

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